作　　者： ; ; ;

机构地区： 中山大学物理科学与工程技术学院物理系

出　　处： 《中山大学学报（自然科学版）》 1992年第2期122-125,共4页

摘　　要： 本文利用磁控反应溅射法研究制备氮化钛薄膜,结果表明,氮气分气压P_(N_2)直接影响膜中的氮、钛原子比,适当的衬底负偏电压可以消除膜中氧原子的存在。薄膜变与膜中原子组份、微观结构有关。 The titanim nitrade films deposited by reactive DC magnetron sputting have been investigated. The deposition parameters such as the partial nitrade pressure P_N_2, the substrate bias voltage Vb and the substrate temperature Tb are discussed and their effects on the film atomic composition and physical properties are presented. The results showed that the nitrogen-to-titanium ratio is directly related to P_N_2. Impurity oxygen in the films can be elimiated for |Vb|>100V and the substrate temperature affects the microstructure of the films. It pointed out that the changes of the properties are related to changes of the atomic composition and microstructure of the films

关 键 词： 氮化钛 薄膜 磁控反应溅射

领　　域： [理学] [理学]