作　　者： ; ; ; ; ; ; ;

机构地区： 中国科学院金属研究所

出　　处： 《人工晶体学报》 2003年第6期613-617,共5页

摘　　要： 采用电弧离子镀方法,在Si(100)基底上分别在高纯Ar、高纯H_2和C_2H_2的气氛下沉积类金刚石膜,利用激光Raman谱和X射线光电子能谱(XPS)对沉积膜的结构进行了分析。结果表明与在高纯H_2和C_2H_2气氛下相比,在高纯Ar中沉积类金刚石膜Raman谱的,I_D/I_G值最小,膜中sp^3C含量最高为35.55％。纳米压痕仪测量结果表明不同气氛下沉积膜的硬度和弹性模量分别在16.7～34.8GPa和143.2～236.9GPa之间变化。在高纯Ar气氛下沉积膜的硬度和弹性模量最大分别为34.8GPa和236.9GPa。 Diamond-like carbon (DLC) films were prepared on Si (100) substrates by using arc ion plating (AIP) technique under Ar, H2 and C2H2 gas atmosphere. The microstructure of the DLC films was characterized by Raman spectra and X-ray photoelectron spectra (XPS) . The results show that the minimal ratio ID/IG is 0.52 and the maximum content of sp3C is 35.55% under Ar compared with that under H2 and C2H2. The mechanical properties of DLC films were determined using nanoindentation technique. The hardness is between 16.7 and 34.8GPa, and the Young's modulus is between 143.2 and 236.9GPa. The hardness and Young's modulus of the DLC films deposited under Ar gas obtain a maximum value of 34.8GPa and 236.9GPa, respectively.

关 键 词： 类金刚石膜 电弧离子镀 气体介质 微观结构 力学性能

领　　域： [化学工程]