作　　者： ; (李成）; (杨玮枫）; (欧阳艳东）; (吴永俊）;

机构地区： 汕头大学理学院

出　　处： 《光电子技术》 2014年第4期269-272,277,共5页

摘　　要： 设计光学薄膜改善ITO图案,匹配出各个膜层合适的物理厚度,采用直流磁控溅射和双靶中频反应磁控溅射制备ITO消影膜。经过对样品的测试和实际效果对比,证明了所设计的ITO消影膜不仅能有效改善ITO图案明显的问题,在可见光范围内还可以使透过率变均匀,提高显示效果。 Special optical thin film is designed to improve ITO pattern. With the proper physical thickness of each film layer being figured out,the invisible ITO film is fabricated by DC magnetron sputtering and medium frequency magnetron reactive sputtering. By measuring the samples and comparing their actual effects,it is shown that the ITO pattern can not only be improved effectively with the invisible film,but the transmittance can also be made uniform in visible light,which is able to improve the display effect.

关 键 词： 玻璃 反射率 消影膜 光学薄膜

领　　域： [理学] [理学]