作　　者： ; ; ; (师昌绪）;

机构地区： 中国科学院金属研究所

出　　处： 《材料科学进展》 1992年第1期56-59,共4页

摘　　要： 本文用热丝 CVD 法在氮化硅复合陶瓷及 Sialon 陶瓷上沉积了金刚石薄膜,用 X 射线衍射、拉曼光谱、扫描电子显微镜、表面形貌仪、划痕实验仪对所形成的膜及基体进行了分析。初步探讨了膜与基材的附着性影响因素。 In this paper,diamond film had been synthesized on Si_3N_4+SiC composite ce-ramics and sialon ceramics by HFCVD(hot filament chemical vapor deposition).The obtaindfilms were analysized by X-ray diffraction,Raman spectrometer,scanning electron microscopy,profilograph and scratch tester.The adhesion of the film was measured and the effective actor ofthe adhesion between the film and substrate was tentativly studied.

关 键 词： 沉积 陶瓷 热丝 金刚石薄膜

领　　域： [电子电信]