作　　者： ; ; ; (李庆波）;

机构地区： 哈尔滨工业大学

出　　处： 《应用光学》 1991年第6期46-49,53,共5页

摘　　要： 以传统的光学监控法与石英晶体振荡法为基础,在薄膜沉积过程中,同时测量膜片的透过率及膜层的厚度,以及与它们对应的控制波长,并根据三者与折射率之间的关系,由计算机反解出不同膜厚处的折射率——非均匀折射率及不同厚度、不同波长处的薄膜折射率——非均匀色散。同时给出了硫化锌薄膜在水晶石薄膜的测量实例,并进行了分析与讨论。 The transmittance and thickness of the optical thin films as well as the relative monitoring wavelength are measured simultaneo(?)siy during the deposition of thin film based on the combination of the classical optical monitoring and the quartz crystal fi(?)m-thickness monitoring, And the inhomogeneous refractive indices and the inhomogensous dispersion is solved inversely with computer ac(?)ording to the relation between the three above and the refractive index, The measuring examples of ZnS and cryolite thin films are given, analysed and dis(?)eussed in this paper.

关 键 词： 光学薄膜 非均匀 折射率 色散

领　　域： [理学] [理学]