作　　者： ; ;

机构地区： 中山大学物理科学与工程技术学院物理系

出　　处： 《红外与毫米波学报》 2000年第5期338-342,共5页

摘　　要： 将模拟退火 (SA)法应用于椭偏光谱数值反演 ,以达到同时得到介质薄膜的厚度和光学常数谱 ,并对 SA算法作了说明和改进 .作为应用实例 ,计算了 Si衬底上的 Si O2 薄膜和 Ba0 .9Sr0 .1 Ti O3(BST)铁电薄膜的膜厚及光学常数谱 ,同时讨论了椭偏参数ψ和Δ随膜厚及折射率变化的灵敏度 . The simulated annealing (SA) optimization algorithm was used to invert ellipsometric spectra. The thickness and the optical constants spectra of the samples can be obtained simultaneously by this method. The adopted SA method was described in detail. As examples of application, calculated results of thickness and optical constants spectra of SiO 2 films and Ba 0.9 Sr 0.1 TiO 3(BST) ferroelectric films on Si substrate were given. The sensitivities in ψ and Δ with respect to the refractive index and the thickness of the film were also discussed.

关 键 词： 模拟退火法 椭偏光谱 数值反演 薄膜光学性质

领　　域： [理学] [理学] [理学] [理学]