作　　者： ; ;

机构地区： 华南理工大学电子与信息学院

出　　处： 《功能材料》 2013年第21期3146-3148,共3页

摘　　要： 采用室温磁控溅射的方法在玻璃衬底上沉积掺Ti氧化铟薄膜，并在真空中采用XeCl准分子激光进行退火，样品的光学、电学性能、相结构分别采用分光光度计、霍尔效应测试仪和X射线衍射仪进行测试。结果表明，功率为100～150mJ／cm^2的准分子激光照射可以使薄膜由无定形态转变为结晶态，激活所掺杂的Ti原子，降低薄膜的电阻率；增大退火功率还可以进一步降低载流子浓度，提高薄膜的透过率。经150mJ／cm^2准分子激光退火的掺Ti氧化铟薄膜，其电阻率为6．93×10^-4Ω·cm，透过率达到了88．4％。 ITiO film was deposited by the methods of room temperature magnetron sputtering and annealed by the XeCI excimer laser in vacuum. The optic, electronic characteristics and phase structure were tested by spec- trophotometer, hall-effect testing instrument and X-ray diffractometer respectively. The result show that, irra- diation by excimer laser with power of 100-150mJ/cm^2 can convert the thin film from the amorphous state to a polymorphic state, activate the doped Ti atoms, and decrease the resistivity of the film. In addition, improve the laser power can reduce the carrier concentration and make the transmittance increase. By the excimer laser annealing of 150mJ/cm^2, the resistivity of the ITiO film was 6.93× 10^-4Ω· cm, and transmittance can reach 88.4%.

关 键 词： 掺 氧化铟 室温沉积 激光退火

领　　域： [理学] [理学]