作　　者： ; ;

机构地区： 广东工业大学

出　　处： 《真空科学与技术》 2000年第5期373-376,共4页

摘　　要： 用Ti/Mo ,Ti/W和Ti/Me(Me为Fe Cr Al合金 )复合靶采用真空电弧技术沉积了多元膜 ,并对成分离析效应及组织和性能进行了研究。结果表明 ,工作弧电流和阴极镶嵌体的弧斑平均电流对成分离析效应影响程度较大 ,Ti/Me复合靶存在一个无成分离析效应的平衡点。多元膜结构主要为组元原子固溶于Ti2 N中的结构形式 。 Multielement films were deposited by vacuum arc ion plating using the Ti/Mo,Ti/W and Ti/Me(Me:Fe Cr Al alloy) compo site cathode targets.The composition demixing,microstructure and properties of the films were studied.The results showed that the working arc current and average current of arc spot of the mosaic cathode materials strongly affect composition demixing.Composite target of Ti/Me has a balance point with no demixing.The structure of the films was mainly Ti 2N in which multielement atoms were dissolved.The films has high microhardness.

关 键 词： 真空电弧沉积 多元膜 成分离析效应 复合靶

领　　域： [一般工业技术] [理学] [理学]