帮助 本站公告
您现在所在的位置:网站首页 > 知识中心 > 文献详情
文献详细Journal detailed

利用PCB碱性蚀刻废液制备高纯度纳米铜粉
Preparation of highly pure copper nanoparticles from spent alkaline PCB etching solution

作  者: ; ; ; ; (谢金平); (吴耀程); (梁韵锐);

机构地区: 广东工业大学轻工化工学院

出  处: 《电镀与涂饰》 2013年第4期38-42,共5页

摘  要: 采用液相化学还原法从碱性蚀刻废液中制备高纯度的纳米铜粉,以回收碱性蚀刻废液中的铜。研究了还原剂种类和用量、反应温度和反应时间对纳米铜粉形貌、粒度和分散性的影响。结果表明,制备纳米铜粉的最佳还原剂为水合肼,最优工艺条件为:PVP(聚乙烯吡咯烷酮)0.003g/L,CTAB(十六烷基三甲基溴化铵)0.002g/L,n(N2H4.H2O):n{[Cu(NH3)4]2+}=1:3,反应温度70°C,反应时间30min。采用最优工艺可制得球状、粒径在100nm范围内、纯度高、抗氧化性好的纳米铜,对碱性蚀刻废液中铜的回收率在98%以上。 Highly pure copper nanoparticles were prepared from spent alkaline etching solution by chemical reduction with a view to reusing the copper in spent alkaline etching solution. The effects of the type and dosage of reductant, reaction temperature, and reaction time on morphology, particle size, and dispersibility of copper nanoparticles were studied. The results show that the most favorable reductant for preparation of copper nanoparticles is hydrazine hydrate. The optimal process parameters are as follows: polyvinyl- pyrrolidone (PVP) 0.003 g/L, cetyltrimethyl ammonium bromide (CTAB) 0.002 g/L, molar ratio of N2H4.H2O to [Cu(NH3)4]2+ 1 : 3, reaction temperature 70 ℃, and reaction time 30 min. Globular and highly pure copper nanoparticles with particle size smaller than100 nm and strong resistance to oxidation can be prepared under the optimal process conditions. The recovery of copper from spent alkaline etching solution by this method is up to 98%.

关 键 词: 碱性蚀刻液 回收 纳米铜 化学还原 水合肼

领  域: [理学] [理学] [环境科学与工程]

相关作者

相关机构对象

相关领域作者

作者 刘广平
作者 彭刚
作者 杨科
作者 龙志和
作者 何花