机构地区: 电子部
出 处: 《光子学报》 1999年第12期1141-1145,共5页
摘 要: 本文研究了由两个磁透镜组成的电子束打靶微束斑X 射线源的聚焦系统- 首先利用有限元法计算了磁透镜的磁感应强度的轴上分布,在此基础上用三次样条函数插值计算了磁场的空间分布,最后用四阶RungeKutta 法追踪了电子的运动轨迹,并给出了入射电子束经过聚焦系统后的缩小倍率- The focusing system which is consist of two magnetic lens in X ray source with micro beam has been studied in this paper.Finite element method (FEM) was used to calculate the axial magnetic field and cubic spline interpolation was used to calculate the spatial magnetic field.Furthermore,the electron trajectory was traced by Runge Kutta method.The finial size of electron beam image was suited for micro beam X ray source.