作　　者： ; ; ; ;

机构地区： 广州大学物理与电子工程学院

出　　处： 《核聚变与等离子体物理》 2012年第3期278-282,共5页

摘　　要： 在微波化学气相沉积装置上采用微波激发氢气甲烷体系等离子体,通过光学多道分析仪采集等离子的发射光谱。实验表明,甲烷在等离子体中的裂解产物主要以CH,CH?,C2基团的形式存在。这些基团的发射光谱强度主要受放电压强和放电功率的影响。随着微波功率的增加甲烷基团发射光谱强度呈增长的趋势;而随着放电压强的增加则是先增大,后减小。这些实验结果对于理解微波等离子体化学气相沉积(MPCVD)中各种反应过程,调整薄膜制备工艺提供了参考。 The emission spectroscopy of the hydrogen and methane plasma which induced by microwave plasma in a chemical vapor deposition reactor was detected by multichannel spectrometer. It shows that the CH, CH, C2 groups were main cracking production of methane in the plasma. The intensity of emission spectra of these groups was strongly impacted by the power and pressure during discharge process. With increasing microwave power the spectrum intensity was enhanced, with increasing discharge pressure, however, the spectrum intensity was first risen and then dropped. These experimental results provide a reference to comprehend various reactions in the microwave plasma chemical vapor deposition （MPCVD） and, therefore, to improve film preparation.

关 键 词： 发射光谱 甲烷等离子体 光谱强度

领　　域： [理学] [理学]