作　　者： ; ; ; ; ; ; ;

机构地区： 深圳大学

出　　处： 《深圳大学学报（理工版）》 2011年第5期444-448,共5页

摘　　要： 采用大气压等离子体喷涂和高速大气压等离子体喷涂技术制备Cu/W涂层,分别对该涂层断面的表面形貌、孔隙率、氧含量和结合强度进行测试分析.结果表明,高速大气压等离子体喷涂技术制备的Cu/W涂层在孔隙率和氧含量方面突显优势.采用高速大气压等离子体喷涂技术制备的Cu/W涂层孔隙率低于3%,且大部分孔径均小于1μm,利用EDS测得的W涂层氧含量为w(O)=0.41%,该值与真空等离子体喷涂制备的W涂层含氧量接近.与真空等离子体喷涂技术相比,高速大气压等离子体喷涂制备W涂层技术的复杂性和制作成本显著降低,在工程应用中实用可行. Tungsten（W） coatings were fabricated on copper（Cu） by atmospheric plasma spray（APS） and high-speed atmospheric plasma spray（HAPS） technique.The properties of the porosity,oxygen content,and the bond-ing strength were measured.The results obtained indicated thatthe HAPS-Wcoating shows beneficial properties par-ticularly in terms of porosity and oxygen content.The porosities of the HAPS-Wcoatings are less than 3% and mostof the pores were smaller than 1μm.The oxygen content of the APS-W and HAPS-W coatings measured by EDSwerew（O） =1.25% andw（O） =0.41% respectively.The results suggest that the HAPS-Wcoating shows betterperformance than thatof the APS-Wcoating and some of the results of the HAPS-Wcoating has achieved the reported effect of vacuum plasma spray（VPS） W coating.Compared with VPS,the HAPS technique greatly reduces thecomplexity and cost of production.The HAPS-W technique provides a convenient and low cost way to obtain good-quality coatings,and it has great feasibility and practicality in engineering.

关 键 词： 低温等离子体物理 高速大气压等离子体喷涂 喷涂涂层 铜 钨 涂层性能 等离子体第一壁材料

领　　域： [理学] [理学]