作　　者： ; ;

机构地区： 汕头大学理学院

出　　处： 《物理学报》 1999年第1期114-120,共7页

摘　　要： 利用脉冲激光制膜法，在多种衬底和温度条件下，系统研究了Ｌａ０．５Ｓｒ０．５ＣｏＯ３（ＬＳＣＯ）薄膜的结构和外延生长特性，在ＬａＡｌＯ３，ＳｒＴｉＯ３和ＭｇＯ衬底上实现了ＬＳＣＯ薄膜的外延生长．外延生长的薄膜具有低的电阻率和金属性导电特征．研究表明，外延生长的最佳温度范围为７００—８００℃，最佳衬底为ＬａＡｌＯ３．并着重探讨了衬底材料和淀积温度等多种因素对ＬＳＣＯ薄膜的生长与性能的影响及其机理． Abstract The structures and the epitaxial growth behavior of the La 0.5 Sr 0.5 CoO 3 thin films prepared by pulsed laser deposition on various substrates and at different deposition temperatures have been studied systematically.Epitaxial growth of the LSCO thin films with low resistivity and metallic conducting features has been demonstrated on the substrates of LaAlO 3,SrTiO 3 and MgO.Studies reveal that for the epitaxial growth of LSCO thin films,700—800℃ are the optimal deposition temperatures and LaAlO 3 is the optimal substrate.Emphases are laid on the discussions of the influences and the mechanisms of substrates and deposition temperatures on the epitaxial growth of the LSCO thin films.

关 键 词： 薄膜 超导体 外延生长 机理

领　　域： [电气工程] [一般工业技术]