作　　者： ; ; ;

机构地区： 广州大学物理与电子工程学院

出　　处： 《物理实验》 2009年第11期1-4,共4页

摘　　要： 在MPCVD装置中,通过调节微波功率、气体流量及反应压强,使用高分辨率的多道光学分析仪采集得到Ar的400-440 nm光谱,利用玻耳兹曼＂斜率法＂得到Ar激发温度Texc.结果显示：随气体流量增加Texc降低;随着微波功率的增加Texc升高;谱线强度随着功率的增加而上升,在550 W及700 W处开始降低继而又上升,此点是制备金刚石膜的功率关键点. Ar emission spectrum in MPCVD equipment is got by utilizing high resolution optical multi-channel analyzer.Microwave power,gas flux and pressure are changed.Excitation temperature is got by utilizing Boltzmann slope.Ar spectral characteristic is studied.It is shown that excitation temperature increases with increasing microwave power,and decreases with increasing gas flux,the spectral line intensity initially increases with increasing microwave power,decreases at 550 W and 700 W,and then increases again. These are the key points in diamond film fabrication with MPCVD method.

关 键 词： 金刚石膜 发射光谱 激发温度 谱线强度

领　　域： [理学] [理学]