作　　者： ; ;

机构地区： 广东工业大学材料与能源学院材料科学与工程系

出　　处： 《金属热处理》 1998年第10期14-17,共4页

摘　　要： 探讨了在铝及铝合金基体上离子镀ＴｉＮ薄膜的可行性，研究了各工艺因素和掺入微量Ｃｒ、Ｆｅ对ＴｉＮ膜质量及性能的影响，同时还研究了铝基离子镀ＴｉＮ薄膜的最佳工艺条件。结果表明，在铝合金基体上离子镀ＴｉＮ薄膜是可行的。 It was studied in the paper that the feasibility of depositing TiN and (TiCrFe)N films on aluminum substrate by multi arc ion plating,and it was studied also that the quality and property of the films was influenced by various technological factors and mixing into the trace amount of Cr and Fe The optimum technological conditions were given It was proved by the research result that depositing TiN films was feasible on aluminum substrate by multi arc ion plating

关 键 词： 离子镀 铝基体 氮化钛薄膜 铝合金 铝

领　　域： [金属学及工艺] [金属学及工艺] [金属学及工艺] [金属学及工艺]