作　　者： ; ; ; ; ;

机构地区： 华南理工大学材料科学与工程学院

出　　处： 《机械工程材料》 2009年第9期79-84,共6页

摘　　要： 利用非平衡磁控溅射与离子源复合沉积技术,以高纯甲烷和氮气作反应气体,钨为溅射靶,在40Cr、Si(100)基片和不锈钢基体上分别制备了厚度约为2μm的掺杂钨类金刚石膜,并在类金刚石膜与基体间沉积了过渡层;应用X射线衍射、拉曼光谱、俄歇电子能谱等手段分析了掺杂钨类金刚石膜的显微结构和表面成分;应用球盘摩擦磨损试验机以及纳米硬度计等测试了膜的硬度、摩擦性能及结合强度。结果表明:所制备的膜表面均匀、致密、光滑,具有典型的类金刚石结构特征;掺杂的钨弥散分布在无定型的碳中,一部分形成W2C微晶相;当膜中钨原子分数约为20%时,膜的硬度最高,摩擦因数也相对较小,膜基结合力在70 N以上。 About 2 μm thick diamond-like-carbon （DLC） films doped W were prepared on the matrixes of 40Cr, Si（100）, starrdess steel respectively by means of unbalanced magnetron sputtering and ion source complex deposition using pure CH4 and N2 as reaction gases and pure W as sputtering targets. A transition layer between diamond-like-carbon film and matrix was deposited. Raman spectroscopy, Auger depth profiling, X-ray diffraction and nano-indentation were used to characterize＇the composition, microstructure and properties of the multilayer films. The results show that a typical, smooth,： uniform and dense DLC film with the doped W and formed W2C interspersed within it was obtained, and the doped W dispersively distributed in amorphous carbon. A low friction coefficient and high hardness, as well as a good bonding strength of over 70 N were obtained with W about 20at%.

关 键 词： 非平衡磁控溅射 掺杂钨 类金刚石膜 摩擦因数

领　　域： [理学] [理学]