作　　者： ; ; ; ; ; ;

机构地区： 四川大学物理科学与技术学院纳光子技术研究所

出　　处： 《四川大学学报（自然科学版）》 2009年第5期1423-1428,共6页

摘　　要： 多束SPPs干涉光刻是一种可制作纳米尺度光子晶体器件的新型微加工方法,目前尚未见对多束SPPs干涉光刻过程进行模拟分析的专门软件.在分析SPPs激励和传输机理基础上,建立多束SPPs干涉成像模型,并采用VC和Matlab库函数混合编程编制了可计算多束SPPS干涉光刻成像的仿真软件.模拟和分析表明,该模型及软件计算准确、快速,达到预期效果,为实现无掩模SPPs干涉光刻全过程模拟和曝光实验研究的开展提供了技术支撑. Multi-beam lithography SPPs interference is a nano-scale photonic crystals to produce a new type of micro-processing device, has yet to see more of SPPs interference beam lithography process simulation software specialist. In response, SPPs in the analysis of the transmission mechanism of incentives and, based on a multi-beam interference SPPs imaging model and adopt the VC and Matlab programming produced mixed computable SPPS multi-beam interference lithography simulation software imaging. Simulation and analysis show that the software and computing model is accurate, rapid and to achieve the desired result for the realization of non-interference lithography mask SPPs the entire process of simulation and experimental study of exposure to provide technical support.

关 键 词： 多束 干涉光刻 模拟软件 混合编程

领　　域： [机械工程] [理学] [理学]