作　　者： ; ;

机构地区： 四川联合大学材料科学与工程学院金属材料系

出　　处： 《金属学报》 1998年第6期621-626,共6页

摘　　要： 利用X射线光电子能谱（XPS）和X射线衍射等，研究了Zn—48．48Al—1．65Cu—0．03Mg合金液表面氧化膜微细特性．除Al2O3外，氧化膜内还有相当数量的ZnO和金属Zn存在．少量的MgO和MgAl2O4明显富集在膜表面，少量金属Cu滞留于氧化膜中．氧化膜中金属离子明显过剩计算及生产实践表明，这种氧化结果导致合金Zn和Mg含量减少，Al和Cu含量反而增加． The hoe characteristics of the Oxide am on the surface of Zn -- 48. 48Al -- 1. 6 5 Cu 0.03Mg meltl were investigated using X--ray photoelectron spectroscopy (XPS) and X--ray exaction (XRD)etc aam oxide film consists mainly of ZnO, Al2O3 and Zn while a small amount of MgO, MgAl2O4 and Cu also exist in the film. The chides of MgO and MgAl2O4 are obviously concentrated on the surface of the film. In these chides, the phenomenon of an excess of metallic ions is quit evident. In addition, it has been proved that, due to the oxidizing the contents of Zn and Mg in the melt will decrease and that of Al and Cu will increase.

关 键 词： 锌基合金 氧化 合金熔炼 精炼 氧化膜

领　　域： [金属学及工艺] [金属学及工艺] [金属学及工艺] [一般工业技术] [金属学及工艺]