作　　者： ; ; ; ; ; ;

机构地区： 华南理工大学

出　　处： 《涂料工业》 2009年第5期35-38,共4页

摘　　要： 以两种不同软化点的酚醛环氧树脂F-51、JF-41和丙烯酸为原料,合成了两种酚醛环氧丙烯酸酯,并进一步用马来酸酐改性制备了能用稀碱显影的光敏树脂。考察了反应温度、催化剂种类以及催化剂用量对反应的影响。用合成的光敏树脂制成光成像阻焊油墨,经丝网印刷后,紫外光固化40 s,显影性良好,140℃固化30 min,膜硬度≥4H,附着力1级,耐溶剂性好,热分解温度≥300℃。 Two kinds of novolac epoxy acrylates were synthesized by the reaction of two kinds of novolac epoxy F-51, JF-41 with different softening point and acrylic acid, respectively. The two novolac epoxy acrylates were further modified by maleic anhydride to prepare a UV curable photosensitive resins. The effects of temperature and the type and mass ratio of catalyst on reaction were discussed. The structure of resins was characterized by IR spectra. The photoimage electron solder resist ant inks were prepared by using these resins and then cured for 40 s by UV and cured for 30 min by heating at 140 ℃ again. The resulting UV cured films could be readily and fast developed using weak alkali solution. The final cured films exhibit good properties： hardness ≥4H, adhesion grade 1, decomposition temperature over 300 ℃, and good solvent resistance.

关 键 词： 紫外光固化 环氧丙烯酸酯 光敏树脂 马来酸酐

领　　域： [化学工程]