作　　者： ; ; ;

机构地区： 广东药学院基础学院

出　　处： 《西南科技大学学报》 2009年第1期33-37,共5页

摘　　要： 采用脉冲激光沉积方法,通过改变脉冲激光能量在单晶硅衬底上制备了类金刚石薄膜,利用椭圆偏振光谱和拉曼光谱对得到的薄膜进行测试,并对沉积过程中的碳等离子体发射光谱进行了研究。薄膜测试结果表明,随着脉冲激光能量的增大,薄膜sp3成分增多。沉积过程中的碳等离子体发射光谱原位监测表明,随着脉冲激光能量的增大,C、C+、C2+粒子发射光谱强度增强,根据应力模型薄膜sp3成分增多,与薄膜测试结果一致。并且发现C+粒子在形成sp3键过程中起到了非常重要的作用。 Diamond like carbon films were deposited on Si substrates by pulsed laser deposition. The microstructure of the films was investigated by spectroscopic ellipsometry and Raman spectroscopy. And the plasma spectral characteristics in deposition were also investigated. The films tests indicate that the increasing laser energy leads to the more sp^3 bond. The plasma spectral characteristics indicate that the increasing laser energy leads to the more number of C,C^＋ ,C^2＋. And it was also found C^＋ particles play a very important role in the formation of sp^3 bond.

关 键 词： 脉冲激光沉积 类金刚石薄膜 等离子体发射光谱 脉冲激光能量

领　　域： [机械工程] [机械工程] [机械工程] [理学] [理学]