作　　者： ; ; ; ; ;

机构地区： 中山大学

出　　处： 《分析测试学报》 2009年第1期22-26,共5页

摘　　要： 利用X射线光电子能谱(XPS)及氩离子刻蚀技术,原位研究了氩离子轰击对三氧化钨纳米线薄膜的还原作用,钨的价态由+6价逐渐被还原为0价,并获得了具有多价态结构的氧化钨薄膜。通过对实验结果的分析,定性描述了氩离子轰击还原三氧化钨纳米线薄膜的原理,认为择优溅射在整个还原过程中起着关键作用。 The reduction of tungsten trioxide nanowire films produced by Ar ion bombardment was studied using in-situ X-ray photoelectron spectrometry （XPS）. Experimental results showed that the high valence state of tungsten was reduced to its lower states gradually, namely, W6 ＋ - W5 ＋ - W4 ＋ - W2＋ -W＋, and that the tungsten oxide films with multiple valences were obtained. Based on its mechanistic study, it was found that the preferential sputtering played a key role in the process of the surface reduction.

关 键 词： 氧化钨 纳米线 光电子能谱 氩离子轰击

领　　域： [理学] [理学] [理学] [理学]