作　　者： ; ; ; ; ; ;

机构地区： 沈阳航空工业学院

出　　处： 《真空科学与技术学报》 2008年第5期450-453,共4页

摘　　要： 应用直流反应磁控溅射设备在铜基底上制备双层TiOxNy选择性吸收薄膜。当第一层薄膜的制备参数不变时,研究了第二层薄膜中N2流量参数对双层薄膜反射率的影响。结果表明,当第二层薄膜氧氮比为1∶1时具有较好的光谱选择吸收特性,并测试了该样品的太阳吸收率和发射率分别αs=0.920、ε=0.03。 The TiOxNy bi-layers were deposited by DC reactive magnetron sputtering on copper substrates. The influence of the film growth conditions, including gas flow rate, sputtering power and time, and substrate temperatures, on the refleetivity of the TiOxNy bi-layer, was tentatively studied. The results show that the ratio of oxygen and nitrogen flow rates significantly affects the selective absorption of the sunlight, particularly the nitrogen flow rate during the growth of the second layer. After judicious choice of the 2^nd layer growth conditions, at a ratio of the flow rates of oxygen and nitrogen of 1：1, the solar absorbance and the thermal emittance of the hi-layers maximize to αs = 0.920 and ε = 0.03, respectively.

关 键 词： 直流反应磁控溅射 选择性吸收薄膜 反射率

领　　域： [理学] [理学]