作　　者： ; ; ; ; ;

机构地区： 深圳大学物理科学与技术学院

出　　处： 《材料科学与工程学报》 2008年第3期357-360,共4页

摘　　要： 采用脉冲激光沉积方法在Si(100)衬底上制备了类金刚石薄膜,利用椭圆偏振光谱,拉曼光谱及X光电子能谱研究了衬底温度对薄膜的结构和光学性质的影响。结果表明较低衬底温度制备的薄膜的光学常数具有典型的类金刚石特征。衬底温度的升高导致了薄膜的有序化,使得薄膜的sp3键成分改变,从而影响了薄膜的光学常数。衬底温度过高,导致薄膜严重石墨化,表面粗糙度增加,不利于制备高质量类金刚石薄膜。 Diamond-like carbon films were deposited on Si （100） substrates by pulsed laser deposition. The influence of substrate temperature on the microstructure and the optical properties was investigated by spectroscopic ellipsometry, Raman spectroscopy and X-ray photoelectron spectrometry. The optical constants of the films deposited at low substrate temperatures have typical diamond-like characteristics. The increasing substrate temperature leads to the ordering of the microstructure of the films, thus the spa contents and the optical properties of the films change with the increasing substrate temperature. The high substrate temperature leads to serious graphitization of the DLC films and increasing surface roughness of the films, which is not favorable to prepare high quality DLC films.

关 键 词： 类金刚石薄膜 脉冲激光沉积 结构 光学性质

领　　域： [一般工业技术]