作　　者： ; ; ;

机构地区： 河北师范大学化学与材料科学学院

出　　处： 《应用化学》 2008年第4期429-432,共4页

摘　　要： 利用循环伏安方法,将Cu2+离子和Co2+离子分别掺杂到电化学方法制备的MnO2中。采用EDAX和SEM测试技术得到的研究结果说明,金属离子掺杂到了MnO2中,并且使MnO2的形貌发生了一定的改变,即掺入Cu2+的MnO2与单独MnO2的晶须纤细,而掺入Co2+的MnO2颗粒细小密实。掺杂Cu2+离子的MnO2的电容值为38.52×10-3F/cm2,掺杂Co2+离子的MnO2的电容值为36.32×10-3F/cm2,明显高于未掺杂的MnO2(30.66×10-3F/cm2),说明掺杂合适的金属离子是改善MnO2性能的有效方法之一。 Metal ions copper（Ⅱ ） and cobalt（ Ⅱ ） were successfully electrodeposited into manganese oxide by means of cyclic voltammetry, respectively. The results obtained from EDAX and SEM strongly demonstrate that the introduced metal ions were doped into manganese oxide and the configuration of manganese oxide was influenced by the doped metal ions, i.e. , the whisker of Cu^2＋ -doped MnO2 is slender, and the particles of Co^2＋-doped MnO2 is smaller and denser when compared to the pure MnO2. The specific capacitance value of Cu^2＋ -doped MnO2 is 38.52 × 10^ -3 F/cm^2 and that of Co^2＋ -doped MnO2 is 36.32 × 10 ^-3 F/cm^2 which are all higher than the corresponding value of pure MnO2 （ 30.66 × 10^ -3 F/cm^2 ） , suggesting that it is feasible to employ this developed method to generate improved MnO2.

关 键 词： 循环伏安 掺杂 比电容

领　　域： [理学] [理学]