作　　者： ; ; ; ;

机构地区： 广东工业大学物理与光电工程学院

出　　处： 《量子电子学报》 2007年第4期415-419,共5页

摘　　要： 阐述了在光刻应用中准分子激光束整形的原因和整形前后光束能量空间分布结果,并对建立准分子激光束整形的理论模型——高斯-谢尔模型(GSM)的方法进行了介绍。总结和分析了微透镜阵列和衍射相位光栅等光束均质器用于光刻激光束整形的优缺点,包括它们的整形能力、能量损失、干涉效应以及波前和振幅均匀化控制等;同时对主要整形器件的原理、特性和进展情况进行了简要综述。 The causes for beam-shaping of excimer laser in the application of lithography and the results of the beam spatial intensity profiles before and after shaping are expounded. The method of theoretical modeling-Gaussian-Schell model built-up for beam-shaping of excimer is also introduced. The advantages and defects, including the shaping capability, the energy loss, the interference effect, the control of wavefront and uniform distribution of amplitude, etc., of beam-homogenizer such as microlens array and diffractive phase grating and so on used for lithographic beam-shaping are summarized and analyzed. Moreover, the principles, characteristics and progress of the beamshaper are brief reviewed.

关 键 词： 激光技术 准分子激光束整形 光刻 微透镜阵列 衍射相位光栅

领　　域： [电子电信]