作　　者： ; ; ; ; ; ;

机构地区： 广东工业大学物理与光电工程学院

出　　处： 《功能材料与器件学报》 2007年第3期266-270,共5页

摘　　要： 在Pt（111）/Ti/SiO2/Si（100）衬底上,用脉冲激光沉积工艺分别制备出了（110）外延取向生长的（Ba0.65Sr0.35）TiO3/CaRuO3（BST/CRO）异质结构薄膜;BST/CRO异质结构薄膜由纳米晶团簇组成,最大的团簇晶粒达500 nm,平均晶粒尺寸在60～80 nm,薄膜厚度为650 nm.BST/CRO异质结薄膜均为表面平滑和致密结构.BST/CRO异质结薄膜的介电常数和介电调谐率分别高达851和78.1%.与纯BST薄膜比较,用CRO作电极,增益介电常数与介电调谐率. The highly （ 110 ） - oriented （ Ba0.65 Sr0.35 ） TiO3 （ BST）/CaRuO3 （CRO） heterostructure thin films on Pt/Ti/SiO2/Si substrates were prepared by pulsed laser deposition （PLD）. The surface morphology of BST/CRO heterostructure thin film show many grain clusters, with cluster size up to 500 nm, which were composed by nano - sized grains in size of about 60 - 80 nm. It also revealed that a dense, homogenous, uniform microstructure, smooth and pinhole -free surface morphology was obtained in the BST/CRO heterostructure thin films on Pt/Ti/SiO2/Si substrates. The dielectric constant and tunabilities of BST/CRO heterostructure thin films were 851 and 78.1%, respectively. Compared with single composition BST thin films, the CRO bottom electrodes enhanced the dielectric properties and tunabilities.

关 键 词： 脉冲激光沉积 钛酸锶钡薄膜 异质结构 介电调谐率

领　　域： [电气工程] [一般工业技术]