作　　者： ; ; ; ;

机构地区： 大连理工大学材料科学与工程学院三束材料改性教育部重点实验室

出　　处： 《金属学报》 2007年第5期509-514,共6页

摘　　要： 采用脉冲偏压电弧离子镀技术在玻璃基片上室温制备了均匀透明的非晶TiO2薄膜,在0--900 V范围内改变脉冲偏压幅值,考察其对薄膜沉积速率、表面形貌和光学性能的影响．结果表明,随着脉冲偏压的升高,非晶薄膜沉积速率以-100 V为界先高后低;薄膜的吸收边先红移后蓝移,但光学带隙Eg基本无变化,约为3．27 eV;-300 V偏压时薄膜达到原子级表面平滑度,均方根粗糙度Rrms≈0．113 nm,因而薄膜折射率n也最高(nλ=550nm达到已有报道的最高值2．51)． Uniform and transparent amorphous TiO2 films were prepared on glass by pulsed bias arc ion plating at room temperature, The influences of pulsed bias on deposition rate, surface morphology and optical property of the films were investigated by varying the bias from 0 V to -900 V. The deposition rate first increases and then decreases with increasing the bias, and reaches a peak at -100 V. As the bias increases, the film absorption edge shifts to the red side first, and then to the blue side. The band gap almost keeps constant, about 3.27 eV. The film deposited at -300 V exhibits atomic smooth surface, and Rrms is about 0.113 nm, which results in the highest refractive index, nλ=550 nm=2-51, which is more than or equal to the maximum value reported.

关 键 词： 非晶 薄膜 脉冲负偏压 电弧离子镀 光学性能

领　　域： [一般工业技术] [理学] [理学]