作　　者： ; ; ; ;

机构地区： 武汉工程大学材料科学与工程学院等离子体化学与新材料湖北省重点实验室

出　　处： 《功能材料》 2007年第5期743-745,749,共4页

摘　　要： 选用V2O5为前驱物,通过在玻璃片上镀膜,采用微波等离子体增强法,在低温条件下,成功制备了氮杂二氧化钒薄膜。通过X射线衍射(XRD),FT-IR对样品进行表征,结果表明:合成的样品为多晶氮杂二氧化钒。相变温度测试结果表明:退火工艺可以降低相变温度,同时提高薄膜的结晶度;改变氮气流量,相变温度先降低后升高,当氮气流量为20ml/min时,相变温度可以降低至40℃。 Synthesis VO2-xNy thin films triumphantly at low temperature by microwave Plasma enhanced route using V2O5 as molecular precursors through coating film in glass slice. The yielded samples were characterized by X-ray diffraction （XRD） and FT-IR, the results show that the samples were VO2-xNy polycrystal. Test the phase transition temperature, the results show： anneal craftwork can fall its phase transition and advance crystallinity of thin film $ at the same time; change the flow rates of nitrogen, the phase transition temperature of thin film can fall in early time but raise later when the flow rates of nitrogen is increase to 20ml/min, when the flow rates of nitrogen is 20ml/min, the phase transition temperature can fall to 40℃.

关 键 词： 微波等离子体 氮杂二氧化钒 相变温度

领　　域： [一般工业技术]