作　　者： ; ; ; ; ;

机构地区： 深圳大学物理科学与技术学院

出　　处： 《中山大学学报（自然科学版）》 2007年第1期26-30,共5页

摘　　要： 采用阴极真空电弧离子沉积技术在硅基片上制备出了MgO薄膜。利用椭圆偏振光谱、原子力显微镜及扫描电子显微镜分别对不同氧流量下制备的MgO薄膜的厚度,光学常数,表面粗糙度及表面形貌进行了分析,并对椭圆偏振光谱的光学粗糙度结果和原子力显微镜的均方根粗糙度结果进行了对比和分析。结果表明,不同氧流量下制备出的MgO薄膜,表面粗糙度及薄膜颗粒随着氧流量的增加而增大。椭偏光谱与AFM得到的表面粗糙度存在线性一致关系,表明椭偏光谱可作为一种很好的无损分析手段。 MgO thin films deposited on Si （100） were prepared by cathodic vacuum arc deposition （CVAD） at different oxygen flow rates. Spectroscopic ellipsometry （SE）, scanning electron microscopy （SEM） and atomic force microscopy （AFM） were performed to study the MgO thin films. The optical constants and optical roughness of these samples were obtained by modeling and calculating from SE. Results show that the optical roughness increases with increasing oxygen flow rate, which is in accordance with the results of SEM and AFM. A linear relationship was obtained by comparing the optical roughness and mean square roughness by AFM, which suggests that SE is an effective method to evaluate thin film surfaces.

关 键 词： 阴极真空电弧离子沉积 薄膜 椭圆偏振光谱 表面粗糙度

领　　域： [理学] [理学]