机构地区: 汕头大学
出 处: 《微纳电子技术》 2007年第4期182-185,194,共5页
摘 要: 用扫描电镜(SEM)对厚度不同的多孔硅膜的微结构进行了研究。对于23μm厚的多孔硅膜,其横截面微结构好似海底生长的海藻;而对于6μm厚的多孔硅膜,其表面微结构则像龟壳上的裂纹。通过对在不同放大倍数情况下拍摄的多孔硅的SEM图片进行分析,结果表明多孔硅薄膜的这两种微结构都具有分形特征,而且其分形维数为2.3~2.6。利用扩散限制凝聚模型(diffusion limited aggregation)对这两种微结构的形成过程进行了模拟。 The typical microstructures of thick and thin porous silicon films were investigated by scanning electron microscopy (SEM) . The cross-section morphology of the thick porous silicon film (23 um) was similar to the seaweeds growing onto a seabed, while the microstructure of the top surface of the thin porous silicon film (6 um) looked like the cracks on a turtle shell. Detailed analysis on the SEM micrographs taken at different magnifications indicates that the two kinds of microstructures possess fractal characteristics, with fractal dimensions of 2.3~2.6. The growth processes were simulated for the two kinds of fractal microstructures with the diffusion limited aggregation model.