作　　者： ; ; (陈春林）;

机构地区： 广东工业大学机电工程学院

出　　处： 《超硬材料工程》 2007年第1期5-9,共5页

摘　　要： 在平面研磨机上使用金刚石抛光盘对金刚石膜进行了抛光实验。通过观察金刚石膜机械抛光过程中表面形貌的变化,并结合拉曼光谱分析,提出了金刚石抛光盘抛光金刚石膜的抛光机理主要是微切削和压力破碎作用,同时还可能有少量金刚石转变为非晶碳的作用。通过单因素实验研究,发现金刚石盘的粒度对抛光金刚石膜材料去除率的影响最为显著。转速越高,表面粗糙度越小,压力和粒度存在最优值,超过该值后,表面粗糙度并不会随之降低。 The mechanical polishing of CVD diamond film was carried out with diamond discs using plane grinding machine. It is proposed that the polishing mechanism of diamond film polishing by diamond discs is mostly micro-cutting and the breakage under mechanical pressure as well as possible transformation of few diamonds into amorphous carbon, according to the surface morphologic change of diamond film during the process of mechanical polishing and combined with Raman spectrum analysis. It is proved by single factor experiment that the particle size of diamond disc affect the polishing efficiency considerably. The higher of rotating speed, the better surface quality is. There exists the optimal pressure and particle size for polishing. The surface roughness would not be further reduced while the pressure and size surpassed the optimal values.

关 键 词： 金刚石膜 抛光加工 机械法 表面粗糙度

领　　域： [金属学及工艺] [化学工程]