作　　者： ; ; ;

机构地区： 清华大学机械工程学院摩擦学国家重点实验室

出　　处： 《中国表面工程》 2006年第5期32-37,共6页

摘　　要： 在Si(100)基底上制备了Ti/TiN和Ni/TiN两种多层膜以及TiN单层膜,利用X射线衍射,WYKO表面形貌仪,俄歇电子能谱等对薄膜进行了分析。分别测试了3种薄膜的粘附力,以及在μN和mN量级载荷下的摩擦力。研究了相对湿度和载荷等条件对3种薄膜的粘附力和摩擦力的影响。结果表明3种薄膜的粘附力均随着相对湿度的增大而增大,3种薄膜的摩擦力均随着载荷增大而增大。Ti/TiN和Ni/TiN膜在μN和mN量级载荷下的摩擦力均小于TiN膜。两种多层膜的摩擦性能较TiN膜有所改善。 Ti/TiN and Ni/TiN multilayered films and TiN single film were prepared on characterized by XRD, WYKO and AES. The adhesion forces, friction under the loads of pN Si（100） wafers. Films were or mN scale, nano hardness of the films were tested. The results showed that the adhesion forces of all three films increased with the relative humidity, and the friction forces of them increased with the loads. The friction forces underμN or mN scale of two multilayered films were smaller than that of TiN single film. The friction properties of two multilayered films were improved compared with TiN single film.

关 键 词： 摩擦 粘附

领　　域： [机械工程]