机构地区: 武汉大学物理科学与技术学院
出 处: 《功能材料》 2006年第10期1557-1560,共4页
摘 要: 利用溶胶凝胶工艺在Pt/TiO2/SiO2/Si衬底上制备了Co掺杂量为0~10%(摩尔分数)的(Ba0.6Sr0.4)Ti1-xCoxO3薄膜。研究了薄膜的结构、表面形貌、介电性能与Co掺杂量的关系。薄膜的介电损耗随着Co含量的增加而减少,在摩尔含量10%时达到最小值0.0128。FOM值在摩尔含量为2.59,6达到最大值20,它的介电常数、介电损耗和调谐量分别为639.42、0.0218、43.6%。 (Ba0.6Sr0.4) Ti1-xCoxO3 (BSTC) thin films doped Co from 0 to 10mol% were fabricated by sol-gel method on Pt/TiO2/SiO2/Si substrate. The struetie,surfaee morphology and dielectric properties of BSTC thin films were investigated as a function of Co dopant concentration. The dielectric loss of the films decreased with increasing Co content. The loss factor of the 10mol% Co doped (Ba0.6 Sr0.4)Ti1-xCoxO3 thin film showed the lowest value of 0. 0128. The figure of merit (FOM) reached a maximum value of 20 at a 2.5mol% Co doped BSTC thin films. The dielectric constant, loss factor, and tunability of the 2.5mol% Co-doped (Ba0.6Sr0.4) Ti1-xCoxO3 thin films were 639.42, 0. 0218, and 43.6%, respectively.
领 域: [一般工业技术]