作　　者： ; ; ; ; ; ;

机构地区： 华中科技大学材料科学与工程学院材料成形与模具技术国家重点实验室

出　　处： 《稀有金属》 2006年第4期505-510,共6页

摘　　要： 透明导电薄膜作为一种新型的光电材料显示出多种优异的光电性能和具有广泛的应用背景。综述了金属基复合透明导电膜的发展历程与研究现状,重点讨论了电介质/金属/电介质(D/M/D)和透明导电氧化物/金属/透明导电氧化物(TCO/M/TCO)这两种类型的多层复合膜,分析了其设计原理和存在问题,并指出了控制金属层的厚度和界面扩散是制备高性能光电薄膜的重要方面,最后介绍了金属基复合膜应用,并对其研究进行了展望。 Transparent conducting film shows various excellent optical and electrical properties and abroad applied background as a new kind of photoelectrical materials. Its tendency of development and research situation were recited and two types of muhilayer films which were dielectric/metal/dielectric （ D/M/D ） and transparent conducting oxide/metal/transparent conducting oxide （TCO/M/TCO） were mainly discussed.The principle of design and existing problems were analyzed, and it was considered that there were two important aspects of fabricating excellent photoelectrical thin film which were controlling the thickness of metal and diffusing of interface. Moreover, the application of multilayer films was presented and the foreground of development was viewed.

关 键 词： 薄膜 透明导电氧化物 电介质 金属基复合 设计原理

领　　域： [金属学及工艺] [一般工业技术] [金属学及工艺]