机构地区: 浙江大学材料科学与工程学系硅材料国家重点实验室
出 处: 《真空科学与技术学报》 2006年第2期84-87,共4页
摘 要: 通过直流反应磁控溅射的方法制备了氧化铅薄膜,并通过XRD和紫外-可见光(UV-Vis)吸收谱对薄膜的晶体结构和光学性能进行了表征。我们发现,直流反应磁控溅射金属铅靶可以形成三种氧化铅薄膜,即非晶态PbO,正交晶系的-βPbO,以及四方晶系的Pb3O4。X射线衍射结果表明,衬底温度和氧气流量对薄膜的生长有很大的影响。当衬底温度小于300℃时,薄膜呈非晶状态,当衬底温度超过300℃时,薄膜开始结晶。另外,氧气流量的改变引起薄膜晶体结构的明显变化。当氧气流量较小时,薄膜为立方相结构的PbO;随着氧气流量的增加,薄膜的晶体结构发生改变,生成四方相结构的Pb3O4的薄膜。UV-Vis吸收谱测试结果表明,不同条件下制备的氧化铅薄膜的UV-Vis吸收谱明显不同。 Lead oxide films were grown by dc reactive magnetron sputtering on glass substrates in a mixture of argon and oxygen. The microstructures and optical properties of the films were characterized with X-ray diffraction (XRD), small angle X-ray reflection, and ultraviolet visible absorption spectroscopy (UV-VIs). Three distinctive phases, amorphous PbO, orthorhombic PbO and tetragonal Pb3O4, were observed. The results show that the substrate temperature and oxygen flow rate strongly affect the lead oxide growth and its properties. For example, at above a critical substrate temperature, say 300℃, amorphous film crystallizes and forms an orthorhombic PbO. Low oxygen flow rate results in orthorhombic PbO, whereas high oxygen flow rate leads to tetragonal Pb3O4. Moreover, UV-Vis absorption spectra considerably depend on morphologies of the lead oxide films.