机构地区: 广东工业大学
出 处: 《材料导报》 2005年第F05期51-54,共4页
摘 要: 近年来,TiO2功能薄膜以其卓越的性能,尤其是优异的光催化性能,引起了国内外广泛关注。针对纳米TiO2功能薄膜气相沉积制备方法中影响TiO2薄膜结构的关键因素(如基体温度、退火温度、基片种类、氧分压、掺杂等)进行了系统总结,并介绍了其研究进展。 In recent years, TiO2 functional thin films have attracted many researchers attention for their excellent properties, especially their outstanding photocatalytic activity. This paper discusses in detail the key factors ( deposition temperature, oxygen pressure, annealing temperature, substrates, adulteration etc ) affecting the microstucture of nanometer TiO2 film prepared by vapor deposition. Research advance is also introduced.