作　　者： ; ; ; ;

机构地区： 广东工业大学材料与能源学院

出　　处： 《电镀与涂饰》 2005年第4期4-6,共3页

摘　　要： 　利用等离子辅助真空电弧沉积技术分别在高速钢片和单晶硅片制备了Ti(C,N)涂层,通过X 射线衍射和扫描电镜研究了不同离子加速电压对单晶硅片上涂层结构和组织形貌的影响,并测定了高速钢片上涂层的显微硬度,同时进行了耐磨性实验。结果表明:涂层主要由TiN和Ti(C,N)组成;随着离子束加速电压的增大,涂层的沉积速度增大,Ti(C,N)的衍射峰不断宽化,晶格尺寸发生变化,但其表面形貌不受影响;当离子束加速电压为1500V时,涂层有较高的耐磨性和显微硬度;当离子束加速电压为2500V时,涂层的耐磨性和显微硬度都有所下降。 Ti(C,N) deposits on high speed steel slice and single crystal silicon slice were prepared by plasma auxiliary vacuum arc deposition technology. The influences of different ion acceleration voltages on structure and morphology of the coatings on single crystal silicon slice were studied. The microhardness and wear resistance of the coatings on high speed steel piece were determined with XRD and SEM. The results show that the coatings are composed of TiN and (Ti(C,N),) (with) increase of ion acceleration voltage, the deposition rate increases, the diffraction peak of Ti(C,N) is continuously widened, and the crystal lattice size changes but the surface morphology has no variation. Both the wear resistance and microhardness of the coatings are high under ion voltage of (1 500 V,) and become reduced under ion voltage of (2 500 V.)

关 键 词： 离子束 真空电孤沉积 涂层

领　　域： [金属学及工艺] [金属学及工艺]