作　　者： ; ; ; ;

机构地区： 河南大学

出　　处： 《化学研究》 2005年第1期35-38,共4页

摘　　要： 在不同的直流负偏压下利用直流射频等离子体辅助化学气相沉积技术在单晶硅表面沉积得到了类金刚石薄膜,用拉曼光谱、红外光谱和原子力显微镜对薄膜的结构和形貌进行了表征.结果表明:无偏压时,沉积得到的薄膜呈现类聚合物结构且表面比较粗糙,而叠加了偏压后,薄膜表现出类金刚石薄膜的结构特征,随着偏压的增大,膜中的氢含量和sp3碳含量均逐渐减小,且薄膜的表面粗糙度逐渐减小. Diamond-like carbon films were prepared on single crystal silicon under different direct current(DC) negative bias by direct current radio frequency plasma enhanced chemical vapor deposition(DC-RFPECVD).The microstructure and morpholopy were characterized by Raman spectroscopy,infrared spectroscopy and atomic force microscopy.The result shows that the film deposited without DC negative bias has an organic polymer-like structure with coarse surface.Howerer,when deposited with the DC negative bias, the film shows diamond-like characteristics. With the increase of negative DC bias voltage,the content of sp^3 species and hydrogen decrease. In addition, increasing the DC bias leads to the reduction of the surface roughness.

关 键 词： 直流负偏压 类金刚石薄膜 等离子体 气相沉积 非晶碳膜 折射率 激光拉曼光谱

领　　域： [理学] [理学] [一般工业技术]