作　　者： ; ; ; ; ; ;

机构地区： 中国科学院上海光学精密机械研究所

出　　处： 《中国激光》 2004年第12期1473-1477,共5页

摘　　要： 为提高高功率激光薄膜的抗激光损伤能力,研究了定向离子清洗对玻璃基片表面性质的影响。用End-Hall型离子源在不同清洗参数下对K9玻璃基片进行了清洗,用光学显微镜验证了基片的二次污染和离子的清洗效果,用静滴接触角仪测量了基片在离子清洗前后对水滴的接触角,用原子力显微镜和轮廓仪分别观测了不同参数的离子清洗前后的基片表面形貌和粗糙度,分析了基片清洗后表面性质如清洁、表面能、接触角、表面粗糙度、表面形貌的变化机理。研究表明定向离子清洗可有效去除二次污染、增加基片表面能、控制基片表面粗糙度和表面形貌,是一种有效改善基片表面性质的处理方法。 To improve the laser induced damage thresholds of high power laser films, the effects of directional ion cleaning on the characteristics of substrate surface were investigated. Using End-Hall ion source, K9 glass substrates were cleaned under different cleaning parameters. The re-contaminated phenomenon and ion cleaning effect were verified by optical microscope. The contact angles of substrates before and after ion cleaning were measured using a contact angle analyzer. Atomic force microscopy (AFM) and profile meter were used to measure the substrate pattern and roughness before and after ion cleaning with different parameters, respectively. After ion cleaning, the mechanisms of substrate surface characteristics modification e. g. cleanness, surface energy, contact angle, surface roughness and surface topography were analysed. The investigation shows that directional ion cleaning can remove the re-contaminated impurity, increase the surface energy, control the roughness and pattern of surface, and it is an efficient substrate surface processing method to improve the characteristics of substrate.

关 键 词： 薄膜 离子清洗 离子源 粗糙度

领　　域： [理学] [理学]