机构地区: 华南理工大学化学与化工学院
出 处: 《合成材料老化与应用》 2004年第4期15-17,30,共4页
摘 要: 研究了稀碱显影耐高温感光树脂的合成及由树脂配置的PCB光致成孔用的光成像绝缘油墨(PDD)的性能。采用丙烯酸类单体改性F 5 1型酚醛环氧树脂的方法 ,合成具有光固化特性的酚醛环氧丙烯酸酯树脂 ,再用马来酸酐进行改性 ,在分子链上引入羧基 ,使树脂具有良好的碱溶性。实验表明 ,选用三乙胺为催化剂 ,阻聚剂含量为 1 5 % ,反应温度为 80℃ ,催化剂含量为 2 0 % ,转化率较高。当改性树脂羧基含量在 35 %~ 4 0 %时 ,PDD具有较好的碱溶性和耐热性。 The synthesis of alkali developable and resistant to elevated temperature photosensitive resin and the property of photo definable dielectric material (PDD) composed mainly by the resin are studied in this paper. By using acrylic acid to modify the F-51 novolac epoxy resin, novolac epoxy acrylate with photosensitive character can be synthesized, which is then induct the carboxyl groups in its molecular chain for good ability of alkali developable by using maleic anhydride. The suitable synthesis condition is that by choosing 2% of catalyzer, triethylamine, 1.5% of polymerization inhibitor and 35%~40% of the carboxyl at a reaction temperature of 80℃. The photo definable dielectric material may be alkali developable and good heat resistance.