作　　者： ; ; ; ; ; ;

机构地区： 广东工业大学轻工化工学院

出　　处： 《分子催化》 2004年第6期452-455,共4页

摘　　要： 以硅溶胶为硅源,水热法制备NiO/SiO2催化剂,用于化学气相沉积法(ChemicalVaporDeposition,CVD法)制备碳纳米管通过SEM表征,研究了催化剂原料及其配比,水热制备工艺条件对催化效果的影响.结果表=1∶12～1∶14,水热温度为180∶MNi(NO3)2明:用硅溶胶可替代正硅酸乙酯作为硅源;制备的最佳条件为:MSiO2～200℃,压力为1.2～1.5MPa,保温时间为0.5～2h. Silica sol is used as silicon source. The NiO/SiO_2 composite catalyst is prepared by hydrothermal method, on which carbon nano-tubes were synthesized by CVD method from catalytic decomposition of enthyne. Effects of raw material, mixture rations of the raw materials and hydrothermal reaction conditions of preparation technology on carbon nano-tubes were studied and characterized by SEM technology. The result showed: ethyl silicate can be replaced of silica sol, which is used as silicon source; Preparation optimum conditions of the catalyst are M_(SiO_2)∶M_(Ni(NO_3)_2)=1∶12～1∶14, hydrothermal temperatures of 180～200 ℃, the pressures of 1.2～1.5 MPa and time of 0.5～2 h, when the catalyst is prepared by hydrothermal method.

关 键 词： 硅溶胶 水热法 碳纳米管 催化剂

领　　域： [理学] [理学]