作　　者： ; ; ; ;

机构地区： 上海大学

出　　处： 《稀有金属材料与工程》 2004年第7期728-730,共3页

摘　　要： 将Zr-4合金样品分别放在盛有350℃,0.1mol/L的LiOH和KOH水溶液的高压釜中进行腐蚀,当2种样品的氧化膜厚度相同时,用二次离子质谱仪(SIMS)测量Li+,K+和OH-在氧化膜剖面上的浓度分布,发现进入氧化膜的Li+比K+深而且记数强度高,同时在LiOH水溶液中腐蚀的样品,其氧化膜中OH-的强度也比在KOH水溶液中腐蚀的样品高,这表明OH-在氧化膜中的分布和扩散与其对应的阳离子有关。根据以上结果讨论了Zr-4合金在LiOH水溶液中耐腐蚀性能降低的原因。 The specimens of Zircaloy-4 are tested in autoclaves filled with 0.1 mol/L LiOH and KOH, respectively, aqueous solutions at 350degreesC. When their oxide layers have an equal thickness, the intensity distribution of Li+, K+ and OH- over the cross section of the oxide layers is determined by SIMS analysis. The results show that the penetration depth of K+ is shallower than that of Li+, and the penetration depth of OH- corroded in KOH solution is also shallower than that corroded in LiOH solution. It is shown that the diffusion of OH- into the oxide layer is accompanied by the corresponding cation. Based on above the results, the difference between the degradation effects of LiOH and KOH solutions on the corrosion resistance of Zircaloy-4 is discussed.

关 键 词： 合金 二次离子质谱 耐腐蚀性能 水化学

领　　域： [核科学技术]