机构地区: 广东省成人科技大学广东广州510091
出 处: 《半导体光电》 2002年第3期191-194,共4页
摘 要: 分析了用于DWDM系统均匀光纤光栅反射特性与光栅、光刻条件的关系 ;给出了用于DWDM系统中的光纤光栅的设计原理、方法及确定光栅参数的流程。采用高斯光束和均匀相位模版 ,用二次曝光技术 ,有效消除了均匀光纤光栅的反射谱旁瓣 。 Relation of optical properties in a uniform FBG vs. its grating parameters and the laser beam engraving conditions is analyzed and the principle and method for designing the uniform FBG used in DWDM system is given. By adopting double exposure technique, with a uniform phase mask and Gaussian laser beam being used, the uniform FBG used in DWDM system is designed and engraved, where, the bandwidth of the main reflection band at -50 dB is about 0.4 nm while the bandwidth at -25 dB is about 0.7 nm.