作　　者： ; ; ; ; ;

机构地区： 武汉大学物理科学与技术学院

出　　处： 《武汉大学学报（理学版）》 2004年第3期320-324,共5页

摘　　要： 利用脉冲激光沉积法在(001)取向的LaAlO_3(LAO)衬底上实现了La_(0.5)Sr_(0.5)CoO_3(LSCO)薄膜的外延)对薄膜结构和表面形貌的影响.X射线衍射结果生长.主要研究了衬底温度(Ts),激光能量(El)和氧气压强(pO2显示在Ts=700～850℃的范围内沉积的LSCO薄膜都具有c轴取向.从扫描电子显微镜和原子力显微镜照片可以看出上述3个沉积参数中,氧压对LSCO薄膜表面形貌的影响最为显著,较低氧压下沉积的薄膜具有较光滑的表面.通过实验,确立了能够制备同时具有c轴取向和光滑表面的薄膜的最佳沉积参数范围. A deposition parameters study of the epitaxial growth of La(0.5)Sr(0.5)CoO3(LSCO) thin films on LaAlO3 (001) substrates by pulsed-laser deposition (PLD) is reported. Films are grown under different substrate temperatures (700-850 ℃), oxygen pressures (2-80 Pa), and incident laser energies (150-450 mJ). The results of X-ray diffraction (XRD) measurements show that LSCO films deposited at substrate temperature range 700-850 ℃ are c-axis oriented. Scanning electron microscopy(SEM) and atomic force microscopy (AFM) images reveal that of all the deposition parameters, oxygen pressure has the most remarkable influence on the surface morphology of LSCO films. The film deposited at lower oxygen pressure has a smoother surface. The optimal ranges of substrate temperature, oxygen pressure and laser energy to produce c-axis oriented films with smooth surface and high metallic conductivity are identified.

关 键 词： 外延生长 脉冲激光沉积 薄膜

领　　域： [理学] [理学]